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Mo Metal Sputtering Target Molybdenum Sputtering Target

Shenzhen APG Material Company Limited
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Mo Metal Sputtering Target Molybdenum Sputtering Target

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Brand Name : APG

Place of Origin : china

Certification : ISO9001、ISO14001、ISO45001、IAFT16949

Packaging Details : Vacuum-sealed packaging, case-packed for storage and transport

Delivery Time : 4-5 weeks

Payment Terms : T/T

Supply Ability : Stable supply

Purity : 99.95%-99.999%

Density : 10.28g/cm

Resistivity : It is 5.17 × 10⁻¹⁰ Ω·cm at 0℃; 24.6 × 10⁻¹⁰ Ω·cm at 800℃; and 72 × 10⁻¹⁰ Ω·cm at 2400℃

Name : Molybdenum Target (Mo)

Forming Process : Hot Pressing Sintering

Product Specifications : Flat target, Rotating target

Application Fields : Semiconductor Industry, Display Panels, Photovoltaic Industry, Low-emissivity Glass

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Molybdenum targets, a rising star in high-performance materials

With the continuous advancement of material science, molybdenum targets have emerged as a key driver in various fields. Molybdenum targets are critical across the semiconductor, display, photovoltaic, and high-end manufacturing sectors, delivering unique performance advantages that drive industrial innovation.

Excellent Properties of Molybdenum Targets

l Ultra-high Purity

Molybdenum targets typically have a high purity of ≥99.95%, with some reaching 5N (99.999%). Extremely low impurity content, such as Fe and Ni <50ppm, and O <200ppm, ensures stable electrical performance of sputtered films, laying a solid foundation for high-precision applications like semiconductor chip manufacturing.

l High-temperature Oxidation Resistance

With an ultra-high melting point of 2623℃, weight gain from oxidation in air at 1000℃ is <0.1mg/cm² (100 hours). For example, a photovoltaic company using Mo targets to prepare TCO films showed no failure after 500 hours under 85℃/85% RH testing, demonstrating outstanding stability in high-temperature and harsh environments.

l Precise Structure and Excellent Conductivity

Density: 10.28 g/cm³ (99% theoretical), grain size <50μm, flatness ≤0.05mm (Φ100mm target). Excellent conductivity of high-purity Mo (resistivity 5.2 μΩ·cm) ensures efficient current transfer during sputtering, improving sputtering efficiency. The precise structural design is compatible with high-precision sputtering equipment, ensuring coating accuracy and uniformity.

Applications of Molybdenum Targets

l Semiconductor Industry

Molybdenum targets are used in the semiconductor industry to prepare bottom electrodes for metal silicon wafers, providing stable current and ensuring wafer quality.

l Display Panels

Molybdenum target material is used in liquid crystal displays (LCDs) to enhance brightness, contrast, color, and lifespan.

l Photovoltaic Industry

Molybdenum targets are used in solar cell manufacturing as electrode materials, improving conversion efficiency.

l Low-emissivity Glass

Molybdenum targets are used in the production of STN/TN/TFT-LCDs and low-emissivity glass, suitable for various coating systems.


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Metal Molybdenum Sputtering Target

      

Mo Metal Sputtering Target

      

Molybdenum Metal Sputtering Target

      
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